ISO 14706:2014 表面化学分析 通过全反射射线荧光光谱（TXRF）测定硅晶片表面自然污染物

标准编号：ISO 14706:2014

中文名称：表面化学分析 通过全反射射线荧光光谱（TXRF）测定硅晶片表面自然污染物

英文名称：Surface chemical analysis — Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

发布日期：2014-08

标准范围

This International Standard specifies a TXRF method for the measurement of the atomic surface densityof elemental contamination on chemomechanically polished or epitaxial silicon wafer surfaces.The method is applicable to the following:— elements of atomic number from 16 (S) to 92 (U);— contamination elements with atomic surface densities from 1 × 1010 atoms/cm2 t o 1 × 1014atoms/cm2;— contamination elements with atomic surface densities from 5 × 108 atoms/cm2 to 5 × 1012 atoms/cm2using a VPD (vapour-phase decomposition) specimen preparation method (see 3.4).

标准预览图