标准编号：ISO 16413:2020
中文名称：X光反射法评估薄膜的厚度、密度及接口宽度 仪器要求、校准及定位，数据采集以及数据分析报告
英文名称：Evaluation of thickness, density and interface width of thin films by X-ray reflectometry — Instrumental requirements, alignment and positioning, data collection, data analysis and reporting
发布日期：2020-08
标准范围
This document specifies a method for the evaluation of thickness, density and interface width of single
layer and multi-layered thin films which have thicknesses between approximately 1 nm and 1 μm, on
flat substrates, by means of X-Ray Reflectometry (XRR).
This method uses a monochromatic, collimated beam, scanning either an angle or a scattering vector.
Similar considerations apply to the case of a convergent beam with parallel data collection using a
distributed detector or to scanning wavelength, but these methods are not described here. While
mention is made of diffuse XRR, and the requirements for experiments are similar, this is not covered in
the present document.
Measurements may be made on equipment of various configurations, from laboratory instruments to
reflectometers at synchrotron radiation beamlines or automated systems used in industry.
Attention should be paid to an eventual instability of the layers over the duration of the data collection, which would cause a reduction in the accuracy of the measurement results. Since XRR, performed at a single wavelength, does not provide chemical information about the layers, attention should be paid to possible contamination or reactions at the specimen surface. The accuracy of results for the outmost layer is strongly influenced by any changes at the surface.
NOTE 1 Proprietary techniques are not described in this document.
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